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Journal Articles

Growth-orientation dependence of magnetic properties of Cr-based multilayers with $$^{119}$$Sn monatomioc layers

Jiko, Norihiro*; Almokhtar, M.*; Takeda, Masayasu; Suzuki, Junichi; Shinjo, Teruya*; Mibu, Ko*

Journal of Magnetism and Magnetic Materials, 272-276(Part2), p.1233 - 1234, 2004/05

The growth-orientation dependence of magnetism of Cr/Sn and Fe/Cr/Sn/Cr multilayers was studied. For Fe/Cr/Sn/Cr multilayers, reduction of Cr magnetic moments was found in both (011)- and (001)-orientated samples, and the effect is larger in the former than the latter. In Cr/Sn multilayers, the (011)-oriented sample with the Cr layer thickness (${it t}$$$_{Cr}$$$$geq$$) of 80$AA  has a commensurate antiferromagnetic structure, while the (001)-oriented samples with {it t}$$$_{Cr}$$$$geq$$ 80AA have a spin-density-wave structure with the wave vector perpendicular to the film plane.

Journal Articles

Alternate multilayer deposition from ammonium amphiphiles and titanium dioxide crystalline nanosheets using the Langmuir-Blodgett technique

Yamaki, Tetsuya; Asai, Keisuke*

Langmuir, 17(9), p.2564 - 2567, 2001/05

 Times Cited Count:41 Percentile:92.2(Chemistry, Multidisciplinary)

A new type of TiO$$_{2}$$ nanosheet-organic complex multilayer film was successfully prepared by the Langmuir-Blodgett technique. Surface pressure-area curves demonstrated that a stable monolayer of dioctadecyldimethylammonium bromide (DODAB) was formed on an aqueous suspension of TiO$$_{2}$$ nanosheets derived from an exfoliated layered titanate, H$$_{x}$$Ti$$_{2-x/4}$$$$_{x/4}$$O$$_{4}$$・H$$_{2}$$O (x$$sim$$0.7; □, vacancy). The hybrid monolayer of the ammonium amphiphiles and the TiO$$_{2}$$ nanosheet was quantitatively transferred onto a hydrophobic quartz plate to form a multilayer film. X-ray diffraction measurements confirmed the formation of an ordered structure of DODAB/TiO$$_{2}$$ with an interlayer distance of 3.4 nm.

Journal Articles

X-ray scattering study of interfacial roughness correlation in Mo/Si multilayers fabricated by ion beam sputtering

Ulyanenkov, A.*; Matsuo, R.*; Omote, Kazuhiko*; Inaba, Katsuhiko*; Harada, Jimpei*; Ishino, Masahiko; Nishii, Masanobu; Yoda, Osamu

Journal of Applied Physics, 87(10), p.7255 - 7260, 2000/05

 Times Cited Count:33 Percentile:76.29(Physics, Applied)

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